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Title:
A film-forming composition, a resist underlayer film and a method for forming the same, and a method for forming a pattern.
Document Type and Number:
Japanese Patent JP6361657
Kind Code:
B2
Abstract:
A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.

Inventors:
Shinya Nakato
Ikuhiro Toyokawa
Takeshi Wakamatsu
Shingo Takasugi
Toru Kimura
Application Number:
JP2015523959A
Publication Date:
July 25, 2018
Filing Date:
June 09, 2014
Export Citation:
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Assignee:
JSR CORPORATION
International Classes:
C08F38/00; C07C15/50; C07C15/54; C07C33/28; C07C211/53; G03F7/11; G03F7/20; G03F7/40; H01L21/027
Domestic Patent References:
JP2004177668A
JP11512430A
JP2009079137A
JP2004504424A
JP2010043176A
JP2012001687A
Foreign References:
WO2012103309A1
US20040198850
Other References:
Edwin Weber, et al.,New trigonal lattice hosts: stoicheiometric crystal inclusions of laterally trisubstituted benzenes?X-ray crystal structure of 1,3,5-tris-(4-carboxyphenyl)benzene惻dimethylformamide ,Journal of the Chemical Society, Perkin transactions II,Chemical Society,1988幓,7,1251-1257,DOI:10.1039/P29880001251
Attorney, Agent or Firm:
Hajime Amano



 
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