Title:
含フッ素化合物、含フッ素高分子化合物、ポジ型レジスト組成物及びそれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP5151710
Kind Code:
B2
Abstract:
A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.
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Inventors:
Yoshimi Isono
Jodri Jonathan Joachim
Satoshi Naritsuka
Jodri Jonathan Joachim
Satoshi Naritsuka
Application Number:
JP2008153096A
Publication Date:
February 27, 2013
Filing Date:
June 11, 2008
Export Citation:
Assignee:
Central Glass Co., Ltd.
International Classes:
C08F20/22; C07C69/72; C08F16/24; C08F32/08; G03F7/039
Domestic Patent References:
| JP2002220416A | ||||
| JP2004302200A | ||||
| JP2005133065A | ||||
| JP2006065211A | ||||
| JP2006328259A |
Attorney, Agent or Firm:
Makoto Koide