Title:
ANTIFOGGING COMPOSITION AND ANTIFOGGING FILM
Document Type and Number:
Japanese Patent JP2018065990
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an antifogging composition capable of forming an antifogging layer which has excellent long sustainability of antifogging properties and antifogging performance, and transparency, suppresses falling off of colloidal silica even under high humidity environment, and is excellent in water resistance.SOLUTION: An antifogging composition contains at least two kinds of colloidal silica having different average primary particle sizes, where a ratio (D2/D1) of an average particle size (D1) of colloidal silica having the smallest average primary particle size to an average primary particle size (D2) of colloidal silica having the largest average primary particle size is 2 to 15.SELECTED DRAWING: None
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Inventors:
GOTO TAKASHI
Application Number:
JP2017197111A
Publication Date:
April 26, 2018
Filing Date:
October 10, 2017
Export Citation:
Assignee:
SEKISUI FILM KK
International Classes:
C09K3/00; A01G9/14; B32B27/08; B32B27/18; C01B33/14
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Foreign References:
| WO2016153050A1 | 2016-09-29 |
Attorney, Agent or Firm:
Patent Business Corporation Saegusa International Patent Office
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