Title:
A formation method of a mask pattern
Document Type and Number:
Japanese Patent JP5994432
Kind Code:
B2
Inventors:
Yujita
Application Number:
JP2012146719A
Publication Date:
September 21, 2016
Filing Date:
June 29, 2012
Export Citation:
Assignee:
Fujitsu Semiconductor Limited
International Classes:
G03F1/70; G03F1/36
Domestic Patent References:
| JP2213164A | ||||
| JP2006140227A | ||||
| JP2010536179A | ||||
| JP2011187538A |
Attorney, Agent or Firm:
Kenji Doi
Hayashi Tsunetoku
Hayashi Tsunetoku