Title:
A formation method of a nature of silicon precise film
Document Type and Number:
Japanese Patent JP6017256
Kind Code:
B2
Abstract:
The present invention provides a dense silicic film and a producing method thereof. This method comprises coating a composition for coating film, which comprises a polymer having a silazane bond on a substrate, on a substrate, irradiating with light having a maximal peak in the range of 160-179 nm wavelength, and then irradiating with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the previous irradiation.
Inventors:
Yuki Ozaki
Sakurai Takaaki
Kobayashi Masakazu
Sakurai Takaaki
Kobayashi Masakazu
Application Number:
JP2012226078A
Publication Date:
October 26, 2016
Filing Date:
October 11, 2012
Export Citation:
Assignee:
Merck Performance Materials Manufacturing LLC
International Classes:
C08J7/00; B05D3/06; B05D7/24; C08J7/048; H01L51/50; H05B33/02; H05B33/04; H05B33/10
Domestic Patent References:
| JP2009503157A | ||||
| JP2004155834A | ||||
| JP10279362A | ||||
| JP2013052561A | ||||
| JP2012056101A |
Foreign References:
| WO2012026482A1 | ||||
| WO2011086839A1 |
Attorney, Agent or Firm:
Hirohito Katsunuma
Yukitaka Nakamura
Noritaka Yokota
Takeyasu Ito
Yukitaka Nakamura
Noritaka Yokota
Takeyasu Ito
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