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Title:
【発明の名称】レジストパタ-ンの形成方法
Document Type and Number:
Japanese Patent JP2506800
Kind Code:
B2
More Like This:
JP2941085PROBLEM TO BE SOLVED: To develop a photoresist and a developing apparatus.
JP4678413Resist material and pattern formation method
JPH03142918FORMATION OF RESIST PATTERN
Inventors:
WATANABE HISASHI
TODOKORO YOSHIHIRO
Application Number:
JP19296587A
Publication Date:
June 12, 1996
Filing Date:
July 31, 1987
Export Citation:
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Assignee:
MATSUSHITA ELECTRONICS CORP
International Classes:
G03F7/38; G03C5/00; G03F7/039; H01L21/027; H01L21/30; (IPC1-7): G03F7/38; H01L21/027
Domestic Patent References:
JP5357974A
JP5461531A
JP61210348A
JP58115435A
Attorney, Agent or Firm:
Tomoyuki Takimoto



 
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