Gas barrier laminated film and transparent substrate

Title:

Gas barrier laminated film and transparent substrate

Document Type and Number:

Japanese Patent JP6307909

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a gas barrier laminated film excellent in gas barrier property and thermal dimensional stability at high temperature (for instance, 180°C or higher).SOLUTION: A laminated film includes: a substrate film; a curing layer on both faces of the substrate film; and a gas barrier layer on at least one face of the curing layer. The curing layer is formed by using a curable composition containing a photopolymerizable compound (A), a photopolymerization initiator (B) and fine particles (C). The average particle size of the fine particles (C) is in a range of 1-50 nm. The thickness of the gas barrier layer is in a range of 5-100 nm. The steam permeability of the whole film is 1.0×10g/m/day or less.

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Inventors:

Yamamoto
Hidetaka Tennai
Shohei Kinoshita

Application Number:

JP2014021366A

Publication Date:

April 11, 2018

Filing Date:

February 06, 2014

Export Citation:

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Assignee:

Mitsubishi Chemical Corporation

International Classes:

B32B27/18; B32B9/00; H01L51/50; H05B33/02

Domestic Patent References:

JP2011194766A

Attorney, Agent or Firm:

Takeuchi/Ichizawa International Patent Office

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