Title:
ガスクラスタイオンビーム処理システム及び方法
Document Type and Number:
Japanese Patent JP2006500741
Kind Code:
A
Abstract:
System and method of gas-cluster ion beam processing is realized by incorporating improved beam and workpiece neutralizing components. Larger GCIB current transport is enabled by low energy electron neutralization of space charge of the GCIB. The larger currents transport greater quantities of gas in the GCIB. A vented faraday cup beam measurement system maintains beam dosimetry accuracy despite the high gas transport load.
Inventors:
Mac, Michael, Yi.
Application Number:
JP2004537918A
Publication Date:
January 05, 2006
Filing Date:
September 19, 2003
Export Citation:
Assignee:
Epion Corporation
International Classes:
H01J37/06; C23C16/452; G01T1/29; G21K5/04; H01J3/14; H01J27/00; H01J37/02; H01J37/04; H01J37/08; H01J37/317; H05H3/02; G21K1/00
Domestic Patent References:
| JPS6424347A | 1989-01-26 | |||
| JPS63224139A | 1988-09-19 | |||
| JPS63230876A | 1988-09-27 | |||
| JPS63225456A | 1988-09-20 | |||
| JPS62296357A | 1987-12-23 | |||
| JPS63146962U | 1988-09-28 | |||
| JPS63230875A | 1988-09-27 |
Foreign References:
| US4361762A | 1982-11-30 |
Attorney, Agent or Firm:
Takenori Hiroe
Takanobu Takekawa
High Shinichi Ara
Nakamura Shigenori
Tsutomu Nishio
Takanobu Takekawa
High Shinichi Ara
Nakamura Shigenori
Tsutomu Nishio