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Title:
A gas ion source and a focused ion beam device
Document Type and Number:
Japanese Patent JP6112930
Kind Code:
B2
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Inventors:
Yasuto Yasaka
Yasuhiko Sugiyama
Hiroshi Ohba
Application Number:
JP2013063707A
Publication Date:
April 12, 2017
Filing Date:
March 26, 2013
Export Citation:
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Assignee:
Hitachi High-Tech Science Co., Ltd.
International Classes:
H01J27/26
Domestic Patent References:
JP6003326A
JP7312196A
JP2010277932A
JP59119660A
JP2009054589A
Attorney, Agent or Firm:
Masatake Shiga
Shingo Suzuki
Nishizawa Kazumi



 
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