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Title:
GAS SOLUTION LIQUID MANUFACTURING EQUIPMENT, GAS SOLUTION LIQUID SUPPLYING EQUIPMENT AND GAS SOLUTION LIQUID MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2016190230
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To manufacture a gas solution liquid with a solubility comparable with a prior art by jetting no water under a high pressure.SOLUTION: Gas solution liquid manufacturing equipment (2) comprises: a circulation channel (A) that circulates a liquid; a mixture part (42), which is a mixture part inserted halfway in the circulation channel (A) with a gas introduction port (81) formed to mix the liquid with a gas introduced from the gas introduction port (81); and a solution part (41), which is a solution part inserted halfway in the circulation channel (A) and contains a filler (18) so arranged as to penetrate through a liquid mixed with a gas, the filler (18) forming a plurality of fine channels.SELECTED DRAWING: Figure 1

Inventors:
TANIMOTO KEISUKE
HIROSE TATSUYA
NAKAJO KAZUMI
HASHIMOTO SATOSHI
NISHIJIMA AKIRA
NAKAJIMA KENTARO
Application Number:
JP2015073308A
Publication Date:
November 10, 2016
Filing Date:
March 31, 2015
Export Citation:
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Assignee:
SHARP KK
IWATANI INT CORP
International Classes:
B01F5/00; B01F1/00; B01F3/04; B01F5/04; B01F5/10; B01F15/02
Domestic Patent References:
JP2008161826A2008-07-17
JP2013103985A2013-05-30
JP2012250176A2012-12-20
JPH0663128U1994-09-06
JP2010155192A2010-07-15
JP2016509534A2016-03-31
Attorney, Agent or Firm:
Harakenzo world patent & trademark