気体処理装置 - Ushio, Inc.

Title:

気体処理装置

Document Type and Number:

Japanese Patent JP7379864

Kind Code:

B2

Abstract:

To realize a gas treatment device that hardly loses its treatment capacity over time. A gas treatment device performs a treatment to a gas to be treated that is a mixture of air and a VOC flowing through a treatment chamber. The device includes a first filter disposed inside the treatment chamber and configured to be able to adsorb a first substance belonging to VOCs in a gaseous form, and an excimer lamp disposed closer to the exhaust port than the first filter and irradiating the gas to be treated with ultraviolet after the gas to be treated has passed through the first filter to allow a second substance belonging to VOCs to be decomposed. The first substance has a higher adsorbability to the first filter in a gaseous form and a higher aerosol formation potential when irradiated with ultraviolet than the second substance.

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Inventors:

Keisuke Naito

Application Number:

JP2019095129A

Publication Date:

November 15, 2023

Filing Date:

May 21, 2019

Export Citation:

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Assignee:

Ushio, Inc.

International Classes:

A61L9/014; A61L9/00; A61L9/015; A61L9/20

Domestic Patent References:

JP2011056191A
JP2016030008A
JP2000060946A

Foreign References:

WO2019080981A2
US8529831
US20180230011

Attorney, Agent or Firm:

Patent Attorney Corporation Junias International Patent Office

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