Title:
The good varying temperature degree method for the electrostatic zipper which can be adjusted
Document Type and Number:
Japanese Patent JP6170540
Kind Code:
B2
Abstract:
An etch processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor reporting a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the temperature control system to maintain the temperature of the chuck at a selectable setpoint temperature. A first setpoint temperature and a second setpoint temperature are selected. The wafer is placed on the chuck and set to the first setpoint temperature. The wafer is then processed for a first period of time at the first setpoint temperature and for a second period of time at the second setpoint temperature.
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Inventors:
Camp Tom Ay
Gott richard
Lee Steve
Lee Chris
Yamaguchi Yoko
Vahedi Vahid
Eppler Aaron
Gott richard
Lee Steve
Lee Chris
Yamaguchi Yoko
Vahedi Vahid
Eppler Aaron
Application Number:
JP2015227250A
Publication Date:
July 26, 2017
Filing Date:
November 20, 2015
Export Citation:
Assignee:
Rum Research Corporation
International Classes:
H01L21/3065; H01L21/00; H01L21/311; H01L21/683; H01L21/768; H05H1/46
Domestic Patent References:
| JP10144655A | ||||
| JP6283594A | ||||
| JP2000049147A | ||||
| JP2000260720A | ||||
| JP2000236015A | ||||
| JP6077148A |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Yoshinori Kishi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Yoshinori Kishi
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