Title:
誘導フラーレン製造装置及び製造方法並びに誘導フラーレン
Document Type and Number:
Japanese Patent JP5065681
Kind Code:
B2
Abstract:
A device and a method capable of producing induction fullerene with high yield are provided. Nitrogen gas being an object to be induced is introduced into a plasma flow producing chamber and a high-temperature flow forming chamber to form a high-temperature plasma flow consisting of nitrogen ions and electrons. A negative voltage is applied to a grid 105 to keep low electron energy in the high-temperature plasma flow. Then by making electrons collide with fullerene introduced from a fullerene sublimating oven 107, electrons are bonded to the fullerene and thereby the fullerene is ionized. A recovering cylinder 112 is disposed in an induction fullerene accumulating chamber so as to enclose a plasma flow. In this fullerene accumulating chamber, induction fullerene such as nitrogen-substitution hetero fullerene and nitrogen-included fullerene is produced and deposited in the recovering chamber 112.
Inventors:
Ryzo Hatakeyama
Kuniyoshi Yokoo
Takamichi Hirata
Yasuhiko Kasama
Table Kenji
Kuniyoshi Yokoo
Takamichi Hirata
Yasuhiko Kasama
Table Kenji
Application Number:
JP2006531555A
Publication Date:
November 07, 2012
Filing Date:
August 04, 2005
Export Citation:
Assignee:
Hiroyuki Kaneko
Ryzo Hatakeyama
Ryzo Hatakeyama
International Classes:
C01B31/02; C07B61/00; C07C13/64; C07C23/46; C07F5/02
Domestic Patent References:
| JPH06166509A | 1994-06-14 | |||
| JP2004196562A | 2004-07-15 |
Attorney, Agent or Firm:
Hisao Fukumori