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Title:
フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物
Document Type and Number:
Japanese Patent JP4275284
Kind Code:
B2
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JP6138827Silicone polymer containing a sulfonic group
Inventors:
Toru Gokawachi
Takeshi Okino
Asakawa Kouji
Naomi Shinoda
Katsunori Funaki
Seiharu Tsutsumi
Akira Horai
Application Number:
JP2000049549A
Publication Date:
June 10, 2009
Filing Date:
February 25, 2000
Export Citation:
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Assignee:
Toshiba Corporation
Daicel Chemical Industry Co., Ltd.
International Classes:
C08F220/28; G03F7/039; C08F220/06; C08F220/18; C08F222/06; C08F232/08; C08K5/00; C08L33/14; H01L21/027
Domestic Patent References:
JP2000122294A
JP2001215703A
JP2001302728A
JP2001296661A
JP2001072674A
JP2001192356A
JP2001192355A
JP2004331981A
JP2004285077A
JP2001188351A
JP2001114835A
Foreign References:
WO1999050322A1
WO1998014831A1
Attorney, Agent or Firm:
Yukihisa Goto



 
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