Title:
高分子化合物及びポジ型レジスト材料並びにこれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4008322
Kind Code:
B2
Inventors:
Jun Hatakeyama
Yuji Harada
Yuji Harada
Application Number:
JP2002268258A
Publication Date:
November 14, 2007
Filing Date:
September 13, 2002
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F232/08; G03F7/039; C08F210/02; H01L21/027
Domestic Patent References:
| JP2002202610A |
Attorney, Agent or Firm:
Mikio Yoshimiya