Title:
スルホン酸エステル基を有する高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4240202
Kind Code:
B2
Abstract:
A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance
Inventors:
Yuji Harada
Jun Hatakeyama
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Kazuhiko Maeda
Haruhiko Komoriya
Satoru Miyazawa
Jun Hatakeyama
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Kazuhiko Maeda
Haruhiko Komoriya
Satoru Miyazawa
Application Number:
JP2003032584A
Publication Date:
March 18, 2009
Filing Date:
February 10, 2003
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
Panasonic Corporation
Central Glass Co., Ltd.
Panasonic Corporation
Central Glass Co., Ltd.
International Classes:
C08F28/02; C07C309/67; C08F212/14; C08F220/12; C08F232/00; G03F7/004; G03F7/027; G03F7/039; H01L21/027
Domestic Patent References:
| JP2004002725A | ||||
| JP2004165595A | ||||
| JP2004244439A | ||||
| JP4198939A | ||||
| JP2000231194A | ||||
| JP2002327013A | ||||
| JP2002322217A | ||||
| JP2002293840A | ||||
| JP200467975A | ||||
| JP2004145048A |
Foreign References:
| WO2003025675A1 |
Other References:
Chemical Abstracts,78:72647
Journal of Photopolymer Science and Technolgy,2002年,Vol.15 No.4,643-54
Journal of Photopolymer Science and Technolgy,2002年,Vol.15 No.4,643-54
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa