Title:
高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4506968
Kind Code:
B2
Abstract:
A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0
Inventors:
Yuji Harada
Jun Hatakeyama
Yoshio Kawai
Masako Sasako
Masataka Endo
Kazuhiko Maeda
Haruhiko Komoriya
Mitsutaka Otani
Jun Hatakeyama
Yoshio Kawai
Masako Sasako
Masataka Endo
Kazuhiko Maeda
Haruhiko Komoriya
Mitsutaka Otani
Application Number:
JP2005028618A
Publication Date:
July 21, 2010
Filing Date:
February 04, 2005
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
Panasonic Corporation
Central Glass Co., Ltd.
Panasonic Corporation
Central Glass Co., Ltd.
International Classes:
C08F220/24; C08F220/28; C08F232/08; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2006195050A | ||||
| JP2004361579A | ||||
| JP2005043819A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa