高分子化合物、レジスト材料及びパターン形成方法

Title:

高分子化合物、レジスト材料及びパターン形成方法

Document Type and Number:

Japanese Patent JP4544389

Kind Code:

B2

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Inventors:

Tsunehiro Nishi
Seiichiro Tachibana
Mutsuko Nakajima
Tsuyoshi Kanao
Takeshi Watanabe
Koji Hasegawa
Jun Hatakeyama

Application Number:

JP2001123986A

Publication Date:

September 15, 2010

Filing Date:

April 23, 2001

Export Citation:

Assignee:

Shin-Etsu Chemical Co., Ltd.

International Classes:

C08F232/00; G03F7/039; C08F222/06; C08F222/40; H01L21/027

Domestic Patent References:

Attorney, Agent or Firm:

Takashi Kojima
Yuko Nishikawa

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