Title:
高分子化合物、レジスト材料、及びパターン形成方法
Document Type and Number:
Japanese Patent JP4831277
Kind Code:
B2
Inventors:
Tsunehiro Nishi
Mutsuko Nakajima
Takeshi Watanabe
Mutsuko Nakajima
Takeshi Watanabe
Application Number:
JP2001213194A
Publication Date:
December 07, 2011
Filing Date:
July 13, 2001
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F32/00; G03F7/039; C08G61/08; H01L21/027
Domestic Patent References:
| JP2001109158A | ||||
| JP2001109157A | ||||
| JP11130845A | ||||
| JP2000098616A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa