Title:
COMPOSITION HAVING HIGH STORAGE STABILITY FOR FORMING ALKALI-SOLUBLE DEVELOPABLE HIGH REFRACTIVE INDEX FILM AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2017052815
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a film-forming composition having high (long-term) storage stability for forming a film having a high refractive index, high transparency, high heat resistance, high light fastness and high hardness.SOLUTION: The film-forming composition comprises: a silicon compound (A) having a weight average molecular weight of 700 to 4000 obtained by hydrolyzing and condensing a hydrolyzable silane comprising compounds of formula (a1) and formula (a2) in a non-alcohol solvent; inorganic particles (B) having an average particle diameter of 1 to 100 nm and a refractive index of 1.50 to 2.70; a curing catalyst (C); water (D); an acid (E); and a solvent (F). The water (D) is included by 6 to 18 wt.% in the whole solvent comprising the water (D) and the solvent (F). The acid (E) is added so as to adjust a pH of the film-forming composition to the range from 3 to 5.SELECTED DRAWING: Figure 1
Inventors:
KATO HIROSHI
NAKAJIMA MAKOTO
KOBAYASHI JUNPEI
NAGAI MASAKI
SUZUKI MASAMUTSU
NAKAJIMA MAKOTO
KOBAYASHI JUNPEI
NAGAI MASAKI
SUZUKI MASAMUTSU
Application Number:
JP2014012676A
Publication Date:
March 16, 2017
Filing Date:
January 27, 2014
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD
International Classes:
C09D183/04; C08K3/22; C08K5/09; C08K5/19; C08K5/36; C08K5/49; C08L83/04; G03F7/11