Title:
CHARGED BEAM WRITING APPARATUS
Document Type and Number:
Japanese Patent JP3031068
Kind Code:
B2
Abstract:
PURPOSE: To prevent troubles so that a written sample expands and contracts due to the variation in temperature of the written sample during a charged beam writing and as a result positional precision of pattern writing deteriorates.
CONSTITUTION: A gas temperature control chamber 12 is installed ahead of a loading chamber 5, and while a gas for setting the loading chamber 5 to an atmosphere is retained in the gas temperature control chamber 12, the temperature control chamber 12 is controlled by a temperature control unit 11. A temperature of the gas for setting the loading chamber 5 to the atmosphere is controlled and thereby the variation in temperature of a written sample in the loading chamber 5 is prevented and then expansion and contraction of the sample during a writing is prevented and thus a position precision of pattern writing is improved.
Inventors:
Youji Tonooka
Application Number:
JP19443492A
Publication Date:
April 10, 2000
Filing Date:
July 22, 1992
Export Citation:
Assignee:
NEC
International Classes:
H01L21/027; (IPC1-7): H01L21/027
Domestic Patent References:
| JP22111A | ||||
| JP6269609A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)