Title:
ＥＵＶ投影リソグラフィのための照明光学系及び照明系
Document Type and Number:
Japanese Patent JP6703944
Kind Code:
B2
Abstract:
An illumination optical unit for EUV projection lithography serves for illuminating an illumination field in which an object field of a downstream imaging optical unit is arranged. An object displaceable in an object displacement direction is in turn arrangeable in the object field. A facet mirror of the illumination optical unit has a plurality of facets arranged alongside one another and serving for the reflective, superimposing guidance of partial beams of a beam of EUV illumination light to the object field. The facet mirror is arranged such that a position of the respective facet on the facet mirror and an impingement region of an illumination light partial beam on the respective facet of the facet mirror predefine an illumination direction for the field points of the object field.
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Inventors:
Patra Michael
Application Number:
JP2016541865A
Publication Date:
June 03, 2020
Filing Date:
August 25, 2014
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2006523944A | ||||
| JP2011517072A | ||||
| JP2004128449A | ||||
| JP2007134464A | ||||
| JP2011512659A | ||||
| JP2012244184A |
Foreign References:
| US6014252 |
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Naoki Kondo
Hiroshi Oura
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Naoki Kondo
Hiroshi Oura