Title:
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
Japanese Patent JP2016188878
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an illumination optical system capable of giving a high illuminance while achieving illuminance uniformity in an illumination area and uniformity of illumination angle characteristics.SOLUTION: The illumination optical system illuminating an illumination target surface includes: a first light-emitting part emitting first illumination light from a first light-emitting surface; a second light-emitting part emitting second illumination light from a second light-emitting surface spaced from the first light-emitting surface; a light-condensing member having a first light-condensing part for condensing the first illumination light from the first light-emitting surface and a second light-condensing part for condensing the second illumination light from the second light-emitting surface; and a relay optical system for overlapping at least a part of the first illumination light passing through the first light condensing part and the second illumination light passing through the second light condensing part, on a conjugate plane that is optically conjugate with the illumination target surface, or on the illumination target surface.SELECTED DRAWING: Figure 2
Inventors:
KOMATSU KOICHIRO
Application Number:
JP2015067762A
Publication Date:
November 04, 2016
Filing Date:
March 28, 2015
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2004039871A | 2004-02-05 | |||
| JP2004335937A | 2004-11-25 | |||
| JP2002083759A | 2002-03-22 | |||
| JP2009163205A | 2009-07-23 | |||
| JP2001343706A | 2001-12-14 | |||
| JP2014164027A | 2014-09-08 |
Attorney, Agent or Firm:
Takao Yamaguchi
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