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Title:
ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS AS WELL AS DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2016206246
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a technology that is advantageous for achieving both throughput and precision improvement in the correction of exposure light quantity unevenness.SOLUTION: Provided is an illumination optical system for illuminating a surface to be illuminated with light from a light source. The illumination optical system includes: a light shielding plate provided between the light source and the surface to be illuminated, and forming a shape of at least a portion of an opening defining the shape of an illumination area on the surface to be illuminated; an adjustment unit for applying a force to the light shielding plate at a position within a predetermined precision required range of the light shielding plate in order to adjust the shape of the opening; and a holding unit for holding the light shielding plate at a position outside the predetermined precision required range of the light shielding plate.SELECTED DRAWING: Figure 2

Inventors:
ARAI MANABU
Application Number:
JP2015083708A
Publication Date:
December 08, 2016
Filing Date:
April 15, 2015
Export Citation:
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Assignee:
CANON KK
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
JP2005191495A2005-07-14
JP2005175040A2005-06-30
JP2001244183A2001-09-07
JP2012222363A2012-11-12
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu