ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS AS WELL AS DEVICE MANUFACTURING METHOD

Title:

ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS AS WELL AS DEVICE MANUFACTURING METHOD

Document Type and Number:

Japanese Patent JP2016206247

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide a technology that is advantageous for achieving both throughput and precision improvement in the correction of exposure light quantity unevenness.SOLUTION: Provided is an illumination optical system for illuminating a surface to be illuminated with light from a light source. A light shielding plate is provided between the light source and the surface to be illuminated in the illumination optical system. The light shielding plate forms a shape of at least a portion of an opening defining the shape of an illumination area on the surface to be illuminated, in an arc. Also, the illumination optical system has a plurality of adjustment units for applying a force to multiple locations of the light shielding plate in the normal direction of the arc in order to adjust the shape of the opening. A first adjustment unit out of the plurality of adjustment units has a relief mechanism that allows a displacement in a direction different from the normal direction when a second adjustment unit applies a force in the normal direction.SELECTED DRAWING: Figure 2

Inventors:

KIMURA KAZUTAKA
ARAI MANABU

Application Number:

JP2015083709A

Publication Date:

December 08, 2016

Filing Date:

April 15, 2015

Export Citation:

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