Title:
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, AND POLARIZATION UNIT
Document Type and Number:
Japanese Patent JP2017004025
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an illumination optical system having high flexibility for changing a pattern of pupil intensity distribution and a polarization state without exchanging optical members.SOLUTION: The illumination optical system illuminates an illumination objective surface with light from a light source, and the system comprises: a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and individually controlled, and which variably forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is disposed in a position optically conjugate with the predetermined plane in an optical path on the illumination objective surface side of the spatial light modulator, and which changes a polarization state of a part of incident light beam and emits the light.SELECTED DRAWING: Figure 1
Inventors:
TANITSU OSAMU
TANAKA HIROHISA
KATO KINYA
MORI KOJI
TANAKA HIROHISA
KATO KINYA
MORI KOJI
Application Number:
JP2016192649A
Publication Date:
January 05, 2017
Filing Date:
September 30, 2016
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/20; G02B5/30; G02B19/00; G03F7/22
Domestic Patent References:
| JP2009111223A | 2009-05-21 | |||
| JP2010087389A | 2010-04-15 |
Attorney, Agent or Firm:
Takao Yamaguchi