ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

Title:

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

Document Type and Number:

Japanese Patent JP2017142519

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide an illumination optical system having a high degree of freedom in changing shapes of a pupil intensity distribution and polarization states without accompanying exchange of optical members.SOLUTION: An illumination optical system for illuminating an object with illumination light includes: a fly eye lens having a rear focal plane disposed on a pupil plane or near the pupil plane that is substantially in an optical Fourier transform relation with a predetermined plane where the object is disposed; a spatial light modulator 3 having a plurality of mirror elements and arranged in an incident side of the fly eye lens; a polarization unit having a plurality of optical elements which can be disposed in the respective optical paths of illumination light and convert polarization states of the illumination light. The spatial light modulator can vary an intensity distribution of illumination light on a pupil plane 7a and can form an intensity distribution where at least a part of the illumination light is distributed in an off-axis region separated from the optical axis on the pupil plane.SELECTED DRAWING: Figure 1

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Inventors:

TANITSU OSAMU
TANAKA HIROHISA
KATO KINYA
MORI KOJI

Application Number:

JP2017064279A

Publication Date:

August 17, 2017

Filing Date:

March 29, 2017

Export Citation:

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Assignee:

NIKON CORP

International Classes:

G03F7/20; G02B5/00; G02B5/30; G02B19/00

Domestic Patent References:

JP2009111223A	2009-05-21
JP2007053390A	2007-03-01
JP2010087389A	2010-04-15
JP2004111579A	2004-04-08
JP2010272640A	2010-12-02
JP2009105396A	2009-05-14

Foreign References:

WO2011021444A1

2011-02-24

Attorney, Agent or Firm:

Takao Yamaguchi

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