Title:
An illumination-light study system, an exposure device, the lighting method, an exposure method, and a device manufacturing method
Document Type and Number:
Japanese Patent JP6132119
Kind Code:
B2
Abstract:
An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.
More Like This:
Inventors:
Osamu Yatsu
Hirohisa Tanaka
Kinya Kato
Takashi Mori
Hirohisa Tanaka
Kinya Kato
Takashi Mori
Application Number:
JP2016016864A
Publication Date:
May 24, 2017
Filing Date:
February 01, 2016
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G02B5/00; G02B5/30; G02B19/00
Domestic Patent References:
| JP2010087389A | ||||
| JP2009111223A | ||||
| JP2010272640A | ||||
| JP2009105396A |
Attorney, Agent or Firm:
Takao Yamaguchi