Title:
EUV投影リソグラフィのための照明光学ユニット
Document Type and Number:
Japanese Patent JP6429171
Kind Code:
B2
Abstract:
An illumination optical unit for EUV projection lithography has a first and second facet mirrors, each with a plurality of reflecting facets on a support. The facets of the first facet mirror can be switched between various tilt positions. In each tilt position, the tiltable first facet is assigned to a second facet of the second facet mirror for deflecting EUV radiation in the direction of this second facet. Each of the first facets is assigned to a set of second facets by its tilt positions. The two facet mirrors are arranged so that an arrangement distribution of second facets, impinged upon via the first facets, results in an illumination-angle distribution of an illumination of an illumination field.
Inventors:
Fisher thomas
Application Number:
JP2015542201A
Publication Date:
November 28, 2018
Filing Date:
October 28, 2013
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G02B19/00; G03F7/20
Domestic Patent References:
| JP2011124584A | ||||
| JP2011228698A | ||||
| JP2005524236A | ||||
| JP2007138805A1 |
Foreign References:
| WO2011080019A1 | ||||
| WO2010145959A1 | ||||
| WO2010003527A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura