Title:
An illumination-light study unit and an optical system for EUV projection lithography
Document Type and Number:
Japanese Patent JP5979693
Kind Code:
B2
Abstract:
An illumination optical unit for EUV projection lithography serves for obliquely illuminating an illumination field, in which an object field of a downstream imaging catoptric optical unit and a reflective object to be imaged can be arranged. A pupil generating device of the illumination optical unit is embodied so that an illumination pupil results, which brings about a dependency of an imaging telecentricity against a structure variable of the object to be imaged. This dependency is such that a dependency of the imaging telecentricity against the structure variable of the object to be imaged on account of interaction of the oblique illumination with structures of the object to be imaged is at least partly compensated for. An optical system for EUV projection lithography also has an imaging catoptric optical unit alongside an illumination optical unit and can additionally have a wavefront manipulation device.
Inventors:
Zimmermann Jorg
Application Number:
JP2015509363A
Publication Date:
August 24, 2016
Filing Date:
April 19, 2013
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2011124584A | ||||
| JP2013532381A | ||||
| JP2011519172A | ||||
| JP2011503831A | ||||
| JP2004179663A | ||||
| JP2013543658A | ||||
| JP2009043933A |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura