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Patent Searching and Data


Title:
投影リソグラフィのための照明光学ユニット
Document Type and Number:
Japanese Patent JP6410741
Kind Code:
B2
Abstract:
An illumination optical unit for projection lithography serves for illuminating an object field, in which an object to be imaged can be arranged, with illumination light. The illumination optical unit has a field facet mirror having a plurality of field facets. Furthermore, the illumination optical unit has a pupil facet mirror having a plurality of pupil facets. The field facets are imaged into the object field by a transfer optical unit. The illumination optical unit additionally has a deflection facet mirror having a plurality of deflection facets, which is arranged in the illumination beam path between the field facet mirror and the pupil facet mirror. This results in an illumination optical unit in which the illumination of the object to be imaged can be configured flexibly and can be adapted well to predefined values.

Inventors:
Maulman fred
Application Number:
JP2015562015A
Publication Date:
October 24, 2018
Filing Date:
March 03, 2014
Export Citation:
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Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B5/08; G02B19/00
Domestic Patent References:
JP2011077142A
JP2011228698A
JP2011525637A
JP2008538452A
JP2003133212A
Foreign References:
US20120188526
WO2013013947A2
US20140132942
US20110228244
US20110122392
US20080192225
US20030081210
WO2011091891A2
US20130021592
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura