Title:
マイクロリソグラフィ投影露光装置の照明系
Document Type and Number:
Japanese Patent JP5868492
Kind Code:
B2
Abstract:
An illumination system of a microlithographic projection exposure apparatus comprises an optical raster plate having a light entrance surface. An irradiance distribution on the light entrance surface determines an angular light distribution of projection light when it impinges on a mask to be illuminated. The illumination system further comprises a control unit and a spatial light modulator which produces on the light entrance surface of the optical raster plate a plurality of light spots whose positions can be varied. At least some of the light spots have, along a reference direction (X), a spatial irradiance distribution comprising a portion in which the irradiance varies periodically with a spatial period P.
Inventors:
Marks Degunter
Application Number:
JP2014508686A
Publication Date:
February 24, 2016
Filing Date:
May 06, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G02B19/00; G03F7/20
Domestic Patent References:
| JP2006189825A | ||||
| JP2009527112A | ||||
| JP2003218017A |
Foreign References:
| WO2009060744A1 |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Rei Ito
Groundwork Kenichi
Rei Ito
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