The illumination system of a micro lithography projection aligner

Japanese Patent JP6034845

B2

An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial light modulator (52) has a light exit surface (57) and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit (36) directs projection light on the spatial light modulator. An objective (58) images the light exit surface (57) of the spatial light modulator (52) onto the light entrance facets (75) of the optical integrator (60). The light exit surface (57) of the optical light modulator (52) comprises groups (54-1 to 54-8) of object areas (110) being separated by areas (130) that are not imaged on the light entrance facets (75). The objective (58) combines images (110') of the object areas (110) so that the images (110') of the object areas abut on the optical integrator (60).

Marx Degunter
Vladimir Davidenko
Thomas Corb
Frank Schlezener
Stephanie hilt
Wolfgang Hijgil

JP2014236389A

November 30, 2016

November 21, 2014

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Carl Zeiss SGM Gaehha

G03F7/20; G02B19/00

JP2011124584A
JP2012004561A
JP2012069656A
JP2012099686A
JP2013048235A

WO2009060773A1
WO2009060744A1
WO2011060975A1
WO2009132756A1
WO2009156038A1
WO2012100791A1

Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura

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