Title:
IMPRINT DEVICE AND MANUFACTURING METHOD OF MATERIAL
Document Type and Number:
Japanese Patent JP2016111062
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an imprint device having an advantageous for reducing an adhesion of a particle to a substrate.SOLUTION: An imprint device that performs an imprint processing so that a pattern is formed to an imprint material on a substrate by using a mold, comprises: a chuck that holds the mold; a head that drivably supports the chuck and is fixed to a molding board; a plate-like member that is disposed between the molding board and the substrate so as to surround a circumference of the chuck; and a first supplying part that supplies a first gas to a first space so as to form an air flow toward a second space of an outer side of the first space from the first space between the plate-like member and the substrate.SELECTED DRAWING: Figure 1
Inventors:
NARUOKA SHINTARO
Application Number:
JP2014244381A
Publication Date:
June 20, 2016
Filing Date:
December 02, 2014
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/027; B29C59/02; G11B5/84
Domestic Patent References:
| JP2014056854A | 2014-03-27 | |||
| JP2013519228A | 2013-05-23 | |||
| JP2013069732A | 2013-04-18 | |||
| JP2014080000A | 2014-05-08 | |||
| JP2013175631A | 2013-09-05 | |||
| JP2009532245A | 2009-09-10 |
Foreign References:
| US20140327183A1 | 2014-11-06 |
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu