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Title:
IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2018078258
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a technology which is advantageous for reducing distortion of and defects in a pattern and preventing a substrate from coming off from a substrate holding part.SOLUTION: An imprint device comprises: a mold holding part which moves while holding a mold; and a substrate holding part which has a plurality of sticking areas for sticking to a substrate and moves while holding the substrate. When releasing the mold, the imprint device decreases a sticking power of a sticking area, of the plurality of sticking areas, at a position where the mold is separated from an imprint material compared with that of a sticking area on the outer peripheral side of the substrate with respect to the position, moves at least one of the mold holding part and substrate holding part by a predetermined amount so as to increase the interval between the mold and substrate, and inclines the mold holding part.SELECTED DRAWING: Figure 1

Inventors:
YOSHIDA SETSUO
HASEGAWA TAKAYASU
Application Number:
JP2016220927A
Publication Date:
May 17, 2018
Filing Date:
November 11, 2016
Export Citation:
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Assignee:
CANON KK
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
JP2013098497A2013-05-20
JP2015201556A2015-11-12
JP2008529826A2008-08-07
JP2015138842A2015-07-30
JP2007083626A2007-04-05
JP2015111683A2015-06-18
JP2015012033A2015-01-19
JP2013162045A2013-08-19
JP2012134214A2012-07-12
JP2011100952A2011-05-19
Attorney, Agent or Firm:
Yasunori Otsuka
Yasuhiro Otsuka
Shiro Takayanagi
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu



 
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