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Title:
2つの方向においてテレセントリックであるフォトリソグラフィック照明器
Document Type and Number:
Japanese Patent JP6501187
Kind Code:
B2
Abstract:
The invention relates to a photolithographic illumination device including: a light beam source; a condenser (5); an optical homogenizing system (4), including at least one microlens array (L3, L4), arranged upstream from the condenser (5) such that the image focal plane of the optical homogenizing system is positioned in the object focal plane of the condenser; a shutter (3), arranged in the object focal plane of the optical homogenizing system, and in which the optical homogenizing system includes two microlens arrays (L3, L4), the spacing as well as the arrangement and orientation of the microlenses of which are designed such that, in two directions (X, Y) orthogonal to the optical axis, the optical homogenizing system has merged image focal planes and merged object focal planes. The invention likewise relates to a photolithographic device including such an illuminator.

Inventors:
Plein Shan, Bertrand
Mercier Itie, Renault
Application Number:
JP2015532463A
Publication Date:
April 17, 2019
Filing Date:
September 25, 2013
Export Citation:
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Assignee:
SAGEM DEFENSE SECURITE
SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
International Classes:
G03F7/20; G02B3/00; G02B19/00
Domestic Patent References:
JP5102010A
JP2004056103A
JP2006070580A1
Foreign References:
CN101587302A
WO2011039261A2
Attorney, Agent or Firm:
Michiharu Soga
Kajinami order
Masahiro Taguchi
Ichiro Oi
Kazuhiro Mitsunaga
Kanayama Asuka



 
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