Title:
SUSCEPTOR DEVICE FOR VAPOR GROWTH
Document Type and Number:
Japanese Patent JPH0711446
Kind Code:
A
Abstract:
PURPOSE: To provide a susceptor device having a susceptor plate excellent in plasma resistance.
CONSTITUTION: In the susceptor device used in a vapor growth device for forming a thin film on a wafer, the susceptor plate 11 for arranging the wafer is made of aluminium nitride. Further the device may be provided with a metallic electrode plate 13 which is an electrode for high frequency installed at a bottom surface of the susceptor plate 11 and an electrode cover 14 which is made of a ceramic material and is attached to the susceptor plate 11 so as to cover the metallic electrode plate 13.
Inventors:
ARIGA MICHIO
OOKURA ATSUNOBU
SAITO AKIHIKO
ANAMI KATSUMASA
OOKURA ATSUNOBU
SAITO AKIHIKO
ANAMI KATSUMASA
Application Number:
JP12610093A
Publication Date:
January 13, 1995
Filing Date:
May 27, 1993
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
C23C16/44; C23C16/458; C23C16/50; H01L21/205; (IPC1-7): C23C16/44; C23C16/50; H01L21/205
Domestic Patent References:
| JPS63140085A | 1988-06-11 | |||
| JPH0594865A | 1993-04-16 |
Attorney, Agent or Firm:
Yoshiki Hasegawa (3 outside)
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