Title:
ラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4539865
Kind Code:
B2
Abstract:
Lactone-containing compounds having formula (1) are novel wherein A1 is a polymerizable functional group having a double bond, R1 is a monovalent C1-C10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH2, O or S. They are useful as monomers to produce polymers for the formulation of radiation-sensitive resist compositions which have high transparency to radiation of up to 500 nm and exhibit good development properties. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography.
Inventors:
Koji Hasegawa
Satoshi Watanabe
Jun Hatakeyama
Tsuyoshi Kanao
Seiichiro Tachibana
Satoshi Watanabe
Jun Hatakeyama
Tsuyoshi Kanao
Seiichiro Tachibana
Application Number:
JP2006001102A
Publication Date:
September 08, 2010
Filing Date:
January 06, 2006
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F20/10; C07D307/93; C07D493/18; C08F32/04; G03F7/039; H01L21/027
Domestic Patent References:
| JP2005320516A | ||||
| JP2005099456A | ||||
| JP2003040894A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa