Title:
ビームデリバリーを備えたレーザリソグラフィー光源
Document Type and Number:
Japanese Patent JP2005502211
Kind Code:
A
Abstract:
The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.
Inventors:
Clen Brian C
Das Palash Pee
Grove Stephen El
Air shovel alexander eye
Smith Scott Tee
Pan Xiao Jean Jay
Sandstrom Richard El
Das Palash Pee
Grove Stephen El
Air shovel alexander eye
Smith Scott Tee
Pan Xiao Jean Jay
Sandstrom Richard El
Application Number:
JP2003525958A
Publication Date:
January 20, 2005
Filing Date:
August 19, 2002
Export Citation:
Assignee:
Cymer Incorporated
International Classes:
H01L21/027; G03F7/20; H01S3/02; H01S3/03; H01S3/036; H01S3/038; H01S3/08; H01S3/097; H01S3/0971; H01S3/10; H01S3/104; H01S3/105; H01S3/223; H01S3/225; H01S3/23; H01S3/00; H01S3/04; H01S3/041; H01S3/0943; H01S3/0975; H01S3/102; H01S3/11; H01S3/13; H01S3/134; H01S3/139; H01S3/22; (IPC1-7): H01S3/10; H01L21/027; H01S3/02; H01S3/23
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Toshio Imajo
Takaki Nishijima
Fumiaki Otsuka
Toshio Imajo
Takaki Nishijima