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Title:
ILLUMINATION DEVICE FOR PROXIMITY EXPOSURE, PROXIMITY EXPOSURE APPARATUS AND PROXIMITY EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2016218381
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an illumination device for proximity exposure, which can correct size variation of an exposure pattern caused by variation in a gap between a work and a mask with a simple configuration, and a proximity exposure apparatus and a proximity exposure method.SOLUTION: The illumination device has a lamp unit 60, a fly eye lens 65 having a plurality of lens elements 65a, and an optical filter 90 that is disposed between the lamp unit 60 and the fly eye lens 65 and that has a plurality of cells 91 divided in the same number as that of the lens elements 65a of the fly eye lens 65 and arranged in a matrix, each having a light transmittance distribution capable of changing an illumination distribution on an exposure surface. The illumination device irradiates a work W closely disposed via a gap G with exposure light through a mask M to transfer an exposure pattern onto the work.SELECTED DRAWING: Figure 2

Inventors:
KAWASHIMA HIRONORI
Application Number:
JP2015106048A
Publication Date:
December 22, 2016
Filing Date:
May 26, 2015
Export Citation:
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Assignee:
V TECH CO LTD
International Classes:
G03F7/20; G02B5/00; G02B19/00
Domestic Patent References:
JP2013097310A2013-05-20
JP2006210553A2006-08-10
JPH0684759A1994-03-25
JPS6442821A1989-02-15
JP2012067246A2012-04-05
Attorney, Agent or Firm:
Patent business corporation glory patent office