Title:
A lighting system using a beam fabrication system and the beam fabrication system concerned
Document Type and Number:
Japanese Patent JP6242501
Kind Code:
B2
Abstract:
A beam shaping system is for example for use over an array of light sources. An array of beam shaping units is arranged in a general plane, each beam shaping unit comprising a central refracting area, an intermediate total internal reflection area for processing of light from a light source beneath the central area, and an outer total internal reflection area for processing light from the nearest light source and an adjacent light source. This outer area essentially extends the useful size of the adjacent beam shaping unit to improve the beam shaping performance and/or the optical efficiency.
Inventors:
Klein Marcelinus Petrus Carolus Michael
Sepkhanov Ruslan Ahmedovich
Sepkhanov Ruslan Ahmedovich
Application Number:
JP2016555321A
Publication Date:
December 06, 2017
Filing Date:
March 04, 2015
Export Citation:
Assignee:
Philips Lighting Holding BV
International Classes:
G02B19/00; F21S2/00; F21V5/02; F21V5/04; G02B3/08; G02B5/00
Domestic Patent References:
| JP2002352611A | ||||
| JP2008310259A |
Attorney, Agent or Firm:
Patent Services Corporation m&s Partners