ILLUMINATION UNIT AND DEVICE FOR LITHOGRAPHIC EXPOSURE - FRAUNHOFER-GES ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG EV

Title:

ILLUMINATION UNIT AND DEVICE FOR LITHOGRAPHIC EXPOSURE

Document Type and Number:

Japanese Patent JP2017054123

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide an illumination unit and a device for lithographic exposure.SOLUTION: An illumination unit (10) for lithographic exposure is described: the illumination unit includes a beam source (1), an electronically controllable beam deflection element (3) for generating temporally varying two-dimensional beam deflection, a collimation lens (4), a beam homogenizing element (5), a Fourier lens (6), and a field lens (7) for telecentric illumination of a photomask (8). A device (20) for lithographic exposure is described, which includes the above illumination unit (10) and the photomask (8).SELECTED DRAWING: Figure 1

Inventors:

UWE DETLEF ZEITNER
TINA WEICHELT
YANNICK BOURGIN

Application Number:

JP2016175384A

Publication Date:

March 16, 2017

Filing Date:

September 08, 2016

Export Citation:

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Assignee:

FRAUNHOFER-GES ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG EV
FRIEDRICH-SCHILLER-UNIVERSITAET JENA

International Classes:

G03F7/20; G02B19/00

Attorney, Agent or Firm:

Einzel Felix-Reinhard
Junichi Maekawa
Hiroyasu Ninomiya
Ueshima

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