A lithography device, a device manufacturing method, and a displacement measurement system

Title:

A lithography device, a device manufacturing method, and a displacement measurement system

Document Type and Number:

Japanese Patent JP5945632

Kind Code:

B2

Abstract:

A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Inventors:

Van der Pasche, Engelvertas, Antonius, Franciscus
Berrens, root, antonius, catalina, maria
Quipers, Martinus, Agnes, Willem
Hogendam, christian, alexander
Jacobs, Franciscus, Matisse
Koenen, Willem Hermann Gaiterda Anna
Luopstra, Eric, Rulov

Application Number:

JP2015527834A

Publication Date:

July 05, 2016

Filing Date:

August 02, 2013

Export Citation:

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