Title:
A lithography device, a sensor, and a method
Document Type and Number:
Japanese Patent JP6100882
Kind Code:
B2
Abstract:
A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode (2) provided on a face (8) of a semiconductor substrate (4) towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material (10) being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material (12) is provided on a side (14) of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.
Inventors:
Evangelista, Fabricio
Crander, Derk
De Bruin, Cornelis
Crander, Derk
De Bruin, Cornelis
Application Number:
JP2015500814A
Publication Date:
March 22, 2017
Filing Date:
February 21, 2013
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01L31/10; H01L21/027
Domestic Patent References:
| JP2004047808A | ||||
| JP2003068637A | ||||
| JP2003197951A | ||||
| JP5067800A | ||||
| JP56024969A |
Foreign References:
| US9470985 | ||||
| WO2010124910A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki
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