Title:
リソグラフィ方法および装置
Document Type and Number:
Japanese Patent JP5650272
Kind Code:
B2
Abstract:
A method and apparatus are provided for determining apodization properties of a projection system in a lithographic apparatus. The method comprises allowing light from a given point in an illumination field to pass through the projection system along at least three different optical paths, and then determining the difference in the intensity of light received in a projection field from the two different optical paths, and calculating apodization properties of the projection system from the intensity difference. It is not necessary to know the intensity distribution in the illumination field. To provide the different optical paths a pinhole reticle provided with wedges of different orientations is used.
Inventors:
バセルマンズ，ヨハネス，ヤコブス，マシューズ
Application Number:
JP2013077786A
Publication Date:
January 07, 2015
Filing Date:
April 03, 2013
Export Citation:
Assignee:
エーエスエムエル ネザーランズ ビー．ブイ．
International Classes:
H01L21/027; G02B19/00; G03F7/20
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki