The lower layer film formation constituent of a self-organization film

Title:

The lower layer film formation constituent of a self-organization film

Document Type and Number:

Japanese Patent JP6070964

Kind Code:

B2

Abstract:

There is a provided an underlayer film-forming composition which is used for an underlayer for a self-assembled film. An underlayer film-forming composition for self-assembled films, comprising a polysiloxane and a solvent. The polysiloxane may be a hydrolysis-condensation product of a silane containing a phenyl group-containing silane, or a hydrolysis-condensation product of a silane containing a silane of Formula (1) [R 2 Si(R 1 ) 3 (1)] wherein R 1 is an alkoxy group, an acyloxy group, or a halogen atom, and R 2 is an organic group containing a benzene ring optionally having a substituent and is a group bonded to the silicon atom through a Si-C bond, in a ratio of 10 to 100% by mol relative to the total silane, or a hydrolysis-condensation product of silanes containing the silane of Formula (1), a silane of Formula (2) [R 4 Si(R 3 ) 3 (2)], and a silane of Formula (3) [Si(R 5 ) 4 (3)] in a ratio of the silane of Formula (1):the silane of Formula (2):the silane of Formula (3) of 10 to 100:0 to 90:0 to 50 in terms of % by mol relative to the total silane:

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Inventors:

Hiroyuki Wakayama
Makoto Nakajima
Rikimaru Sakamoto

Application Number:

JP2014507827A

Publication Date:

February 01, 2017

Filing Date:

March 22, 2013

Export Citation:

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Assignee:

Nissan Chemical Industry Co., Ltd.

International Classes:

C09D183/04; B05D7/24; C09D5/00; C09D7/12; C09D153/00; C09D153/02; C09D183/06; C09D183/07

Domestic Patent References:

JP2013083963A
JP2008036491A
JP2009103831A
JP2011122081A
JP2008242453A
JP2003218383A
JP2008149447A
JP2008143923A
JP2004307653A
JP2002194283A
JP5255648A
JP61209268A

Foreign References:

WO2012008538A1
WO2006101028A1

Attorney, Agent or Firm:

Calyx
Miyazaki Yoshio
Tsutomu Kato
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