Title:
高分子組成物およびその使用
Document Type and Number:
Japanese Patent JP4389158
Kind Code:
B2
Abstract:
The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
Inventors:
Larry F. Rhodes
Richard Vicari
Lee Jay Langsdorf
Andrew A. Sobek
Edwin pee boyd
Brian Bennett
Richard Vicari
Lee Jay Langsdorf
Andrew A. Sobek
Edwin pee boyd
Brian Bennett
Application Number:
JP2003551180A
Publication Date:
December 24, 2009
Filing Date:
December 12, 2002
Export Citation:
Assignee:
Sumitomo Bakelite Co., Ltd.
International Classes:
C08F32/00; C08F8/00; C08F114/18; C08G61/06; G03F7/004; G03F7/039
Domestic Patent References:
| JP11505876A |
Attorney, Agent or Firm:
Kazuo Shamoto
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takumi Terachi
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takumi Terachi