Title:
スパッタ処理による成膜工程に用いる径方向磁場発生用磁気回路
Document Type and Number:
Japanese Patent JP4444797
Kind Code:
B2
Inventors:
Hideki Kobayashi
Application Number:
JP2004329903A
Publication Date:
March 31, 2010
Filing Date:
November 15, 2004
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G11B5/852; H01F13/00
Domestic Patent References:
| JP2002367160A | ||||
| JP3201219A | ||||
| JP2001209931A | ||||
| JP2003343976A |
Attorney, Agent or Firm:
Shoichi Okuyama
Arihara Koichi
Matsushima Tetsuo
Hidefumi Kawamura
Arihara Koichi
Matsushima Tetsuo
Hidefumi Kawamura