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Title:
ガス溶解水の製造装置
Document Type and Number:
Japanese Patent JP5741056
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a production unit of gas dissolved water which reduces deviation from a target value of an agent concentration after addition of chemicals when a change of an amount of water supply is high.SOLUTION: Raw water is sent to a degassing film module 2 via a flowmeter 1, and is degassed. Next, in a gas dissolving film module 4, gas such as hydrogen and the like supplied from a gas supplier 5 is dissolved into water through a gas permeating film 4a. Chemicals such as ammonia water or the like are added to the gas dissolved water from a chemicals storage tub 6 by a chemicals feed pump 7. After agent concentration in the gas dissolved water with the added chemicals is detected by an agent concentration sensor 10, the gas dissolved water is sent to a use point. The chemicals feed pump 7 is controlled based on detection values of the flowmeter 1 and the agent concentration sensor 10. When this takes place, the actual chemicals concentration is found based on raw water flux, an amount of added chemicals, and detection concentration of a concentration sensor 11 to control an amount of fed chemicals.

Inventors:
Junichi Ida
Application Number:
JP2011040407A
Publication Date:
July 01, 2015
Filing Date:
February 25, 2011
Export Citation:
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Assignee:
Kurita Water Industries Ltd.
International Classes:
B01F1/00; B01F3/04; B01F3/08; B01F5/06; B01F15/04
Domestic Patent References:
JP2004305472A
JP10202242A
JP3085356U
JP2010064059A
JP2004283681A
JP2010115639A
JP2010184203A
JP2001009257A
JP11007324A
Attorney, Agent or Firm:
Tsuyoshi Shigeno