Title:
METHOD FOR MANUFACTURING COIL COMPONENT AND COIL COMPONENT
Document Type and Number:
Japanese Patent JP2017011185
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a coil component capable of preventing layer separation due to a thermal stress.SOLUTION: A method for manufacturing a coil component comprises the steps of: bonding a dummy metal layer onto one surface of a base; laminating a base insulation resin 30 on the dummy metal layer; forming a coil substrate by covering a first spiral wiring 21 with a first insulation resin 31 by laminating the first spiral wiring 21 and the first insulation resin 31 in this order on the base insulation resin 30 and covering a second spiral wiring 22 with a second insulation resin 32 by laminating the second spiral wiring 22 and the second insulation resin 32 in this order on the first insulation resin 31; peeling the base from the dummy metal layer on an adhesion surface between one surface of the base and the dummy metal layer; removing the dummy metal layer from the coil substrate; and covering the coil substrate with a magnetic resin 40.SELECTED DRAWING: Figure 2
Inventors:
HAMADA AKINORI
NISHIYAMA KENJI
YASUDA SHINJI
NISHIYAMA KENJI
YASUDA SHINJI
Application Number:
JP2015126933A
Publication Date:
January 12, 2017
Filing Date:
June 24, 2015
Export Citation:
Assignee:
MURATA MANUFACTURING CO
International Classes:
H01F41/04; H01F17/00; H01F17/04; H01F27/28
Domestic Patent References:
JP2007227729A | 2007-09-06 | |||
JP2005243807A | 2005-09-08 | |||
JP2006173159A | 2006-06-29 | |||
JP2014036094A | 2014-02-24 | |||
JP2008166455A | 2008-07-17 | |||
JP2012248630A | 2012-12-13 | |||
JP2013197588A | 2013-09-30 | |||
JP2006278912A | 2006-10-12 | |||
JP2008172049A | 2008-07-24 | |||
JP2001267167A | 2001-09-28 | |||
JPS54115760A | 1979-09-08 | |||
JP2006310716A | 2006-11-09 | |||
JP2007158151A | 2007-06-21 | |||
JP2012114444A | 2012-06-14 | |||
JP2015037189A | 2015-02-23 |
Foreign References:
WO2009057276A1 | 2009-05-07 |
Attorney, Agent or Firm:
Samejima Mutsumi
Yoshida Tamaki
Yoshida Tamaki
Previous Patent: An epitaxial growth system of a silicon carbide semiconductor
Next Patent: A manufacturing method of a reactor and a reactor
Next Patent: A manufacturing method of a reactor and a reactor